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Methods of Forming a Field Effect Transistor, Including Forming a Region Providing Enhanced Oxidation

Samsung Electronics Co., Ltd.

A patent family: one line of work, grouped by real continuity rather than by a technology label inferred from titles. 4 of these applications claim priority to application 63/034,525, filed Jun 4, 2020. A shared origin can cover several different claimed inventions, which is why members here may not share a title. In-force patents first, soonest term end first, then patent number. Expired patents follow, in the same order.
PatentTitleHolderStatusExpiresTime remainingConfidence
US 9,257,327Methods of Forming a Field Effect Transistor, Including Forming a Region Providing Enhanced Oxidation
In force
 · High confidence
Samsung Electronics Co., Ltd.In force
High confidence
US 9,331,176Methods of Forming Field Effect Transistors, Including Forming Source and Drain Regions in Recesses of Semiconductor Fins
In force
 · High confidence
Samsung Electronics Co., Ltd.In force
High confidence
US 9,236,444Methods of Fabricating Quantum Well Field Effect Transistors Having Multiple Delta Doped Layers
In force
 · High confidence
Samsung Electronics Co., Ltd.In force
High confidence
US 9,263,549FIN-FET Transistor with Punchthrough Barrier and Leakage Protection Regions
In force
 · High confidence
Samsung Electronics Co., Ltd.In force
High confidence
US 9,064,699Methods of Forming Semiconductor Patterns Including Reduced Dislocation Defects and Devices Formed Using Such Methods
In force
 · High confidence
Samsung Electronics Co., Ltd.In force
High confidence
US 9,484,423Crystalline Multiple-Nanosheet III-V Channel Fets
In force
 · High confidence
Samsung Electronics Co., Ltd.In force
High confidence
US 9,570,609Crystalline Multiple-Nanosheet Strained Channel Fets and Methods of Fabricating the Same
In force
 · High confidence
Samsung Electronics Co., Ltd.In force
High confidence
US 9,525,053Integrated Circuit Devices Including Strained Channel Regions and Methods of Forming the Same
In force
 · High confidence
Samsung Electronics Co., Ltd.In force
High confidence
US 9,112,130Quantum Interference Based Logic Devices Including Electron Monochromator
In force
 · High confidence
Samsung Electronics Co., Ltd.In force
High confidence
US 9,178,045Integrated Circuit Devices Including FinFETs and Methods of Forming the Same
In force
 · High confidence
Samsung Electronics Co., Ltd.In force
High confidence
23 more patents in this group · Pro
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32 of these are in force and held by Samsung Electronics Co., Ltd..
Updated Nov 14, 2026 · includes USPTO assignment & status data published Nov 14, 2026 and grant & fee data published Nov 10, 2026 (weekly) · how we know
Computed patent terms end on the dates shown. Related patents and pending applications may cover overlapping subject matter.
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