Methods of Forming a Field Effect Transistor, Including Forming a Region Providing Enhanced Oxidation
A patent family: one line of work, grouped by real continuity rather than by a technology label
inferred from titles. 4 of these applications claim priority to application 63/034,525, filed Jun 4, 2020. A shared origin can cover several different claimed inventions, which is why members here may not share a title. In-force patents first, soonest term end first, then patent number. Expired patents follow, in the same order.
| Patent | Title | Holder | Status | Expires | Time remaining | Confidence |
|---|---|---|---|---|---|---|
| US 9,257,327 | Methods of Forming a Field Effect Transistor, Including Forming a Region Providing Enhanced Oxidation In force · High confidence | Samsung Electronics Co., Ltd. | In force | High confidence | ||
| US 9,331,176 | Methods of Forming Field Effect Transistors, Including Forming Source and Drain Regions in Recesses of Semiconductor Fins In force · High confidence | Samsung Electronics Co., Ltd. | In force | High confidence | ||
| US 9,236,444 | Methods of Fabricating Quantum Well Field Effect Transistors Having Multiple Delta Doped Layers In force · High confidence | Samsung Electronics Co., Ltd. | In force | High confidence | ||
| US 9,263,549 | FIN-FET Transistor with Punchthrough Barrier and Leakage Protection Regions In force · High confidence | Samsung Electronics Co., Ltd. | In force | High confidence | ||
| US 9,064,699 | Methods of Forming Semiconductor Patterns Including Reduced Dislocation Defects and Devices Formed Using Such Methods In force · High confidence | Samsung Electronics Co., Ltd. | In force | High confidence | ||
| US 9,484,423 | Crystalline Multiple-Nanosheet III-V Channel Fets In force · High confidence | Samsung Electronics Co., Ltd. | In force | High confidence | ||
| US 9,570,609 | Crystalline Multiple-Nanosheet Strained Channel Fets and Methods of Fabricating the Same In force · High confidence | Samsung Electronics Co., Ltd. | In force | High confidence | ||
| US 9,525,053 | Integrated Circuit Devices Including Strained Channel Regions and Methods of Forming the Same In force · High confidence | Samsung Electronics Co., Ltd. | In force | High confidence | ||
| US 9,112,130 | Quantum Interference Based Logic Devices Including Electron Monochromator In force · High confidence | Samsung Electronics Co., Ltd. | In force | High confidence | ||
| US 9,178,045 | Integrated Circuit Devices Including FinFETs and Methods of Forming the Same In force · High confidence | Samsung Electronics Co., Ltd. | In force | High confidence | ||
| 23 more patents in this group · Pro | ||||||
10 of 33 records shown. In-force patents first, soonest term end first, then patent number. Expired patents follow, in the same order.
Pro members see all 33, including 1 expired.
32 of these are in force and held by Samsung Electronics Co., Ltd..
Updated Nov 14, 2026 · includes USPTO assignment & status data published Nov 14, 2026 and grant & fee data published Nov 10, 2026 (weekly) · how we know
Computed patent terms end on the dates shown. Related patents and pending applications may cover overlapping subject matter.